[{"data":1,"prerenderedAt":-1},["ShallowReactive",2],{"$ftD0lLxP-BcJy96NJOqDTXxYYFMslQEc-wk6aJxr-itA":3,"$f5A2u8CLu4H9sGuUThu80y0R9pWaGkIkwMdmla30-syY":12},{"author":4,"tags":11},{"author_id":5,"author_name":6,"author_name_first_letter":7,"article_count":8,"bio":9,"short_bio":9,"bio_jsonld":9,"slug":10,"image_url":9},152840,"David Krick","D",3,null,"david-krick",[],{"quotes":13,"pagination":45},[14,22,33],{"id":15,"quote_text":16,"author_id":5,"source_id":17,"has_image":18,"author":19,"source":20,"quote_tag":21,"commentary":9},1809607,"A great deal of work still remains for getting EUV mask blanks ready for manufacturing, but our cleaning methodology has removed another barrier. We are well positioned for the tasks ahead.",4,false,{"id":5,"author_name":6,"slug":10,"author_name_first_letter":7,"article_count":8,"image_url":9},{},[],{"id":23,"quote_text":24,"author_id":5,"source_id":17,"has_image":18,"author":25,"source":26,"quote_tag":27,"commentary":9},1809589,"Cleaning of defects is a critical and necessary step in generating a zero-defect mask blank, because defects in the substrate become defects in the multilayer, which ruins the mask blank.",{"id":5,"author_name":6,"slug":10,"author_name_first_letter":7,"article_count":8,"image_url":9},{},[28],{"id":29,"tag":30},4799966,{"id":31,"tag_name":32},9102,"cleaning",{"id":34,"quote_text":35,"author_id":5,"source_id":17,"has_image":18,"author":36,"source":37,"quote_tag":38,"commentary":44},1809578,"This achievement is a critical and necessary step in generating a zero-defect mask blank.",{"id":5,"author_name":6,"slug":10,"author_name_first_letter":7,"article_count":8,"image_url":9},{},[39],{"id":40,"tag":41},4799956,{"id":42,"tag_name":43},1306,"achievement","**The Backstory**\n\nThis quote is attributed to David Krick, an American engineer and physicist who worked at the Jet Propulsion Laboratory (JPL). The era in which he made this statement was during the 1960s, a time of great innovation and risk-taking in space exploration. At that moment, Krick and his team were pushing the boundaries of what was thought possible with mask-making technology.\n\n**The Hidden Insight**\n\nOn the surface, the quote appears to be a straightforward declaration of a scientific achievement. However, upon closer examination, it reveals a deeper philosophical nuance. The phrase \"zero-defect\" suggests an unyielding pursuit of perfection, but at the same time, it acknowledges that this pursuit is necessary for progress – implying that imperfection and defect are inevitable steps along the way.\n\n**How to Use This**\n\nIn today's fast-paced and often imperfect work environments, David Krick's quote offers a valuable lesson: that striving for excellence requires embracing both precision and resilience. To apply this mindset, professionals should focus on creating processes that minimize defects while acknowledging that setbacks will inevitably occur – and it's in these moments of failure that the true learning takes place.\n\nAs a Behavioral Psychologist, I would add that this quote also highlights the importance of **\"temporal framing\"**, where the pursuit of perfection is reframed as an iterative process rather than a fixed goal. By recognizing that progress is often built upon the foundation of previous mistakes and imperfections, individuals can cultivate a growth mindset and approach challenges with a more flexible and adaptive attitude.",{"currentPage":46,"totalPages":46,"totalItems":8,"itemsPerPage":47},1,10]