You don't just want a mask image that will give you an acceptable pattern at exact focus and dose. You want the pattern on the wafer to be acceptable over a reasonable range of focus and dose errors and variations in resist.

-Andrew Moore

Select a background
Awesome background image
Awesome background image
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Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image
Awesome background image

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